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Optics Letters

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  • Editor: Anthony J. Campillo
  • Vol. 32, Iss. 10 — May. 15, 2007
  • pp: 1265–1267

Resonant frequency-domain interferometry via third-harmonic generation

D. S. Stoker, J. W. Keto, J. Baek, M. F. Becker, and J. Ma  »View Author Affiliations


Optics Letters, Vol. 32, Issue 10, pp. 1265-1267 (2007)
http://dx.doi.org/10.1364/OL.32.001265


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Abstract

A method for measuring resonances using a combination of third-harmonic generation and frequency-domain interferometry is described and demonstrated in an index-matched dielectric material. The phase of the third-harmonic spectrum of a pulse generated from a resonant NdAlO 3 thin film and a temporally displaced sapphire substrate pulse was measured by analyzing the spectral interference pattern. The appropriate combination of substrate and film signals was obtained by translating the sample through the laser focus while observing the third-harmonic intensity.

© 2007 Optical Society of America

OCIS Codes
(190.4350) Nonlinear optics : Nonlinear optics at surfaces
(310.1860) Thin films : Deposition and fabrication
(320.0320) Ultrafast optics : Ultrafast optics

ToC Category:
Nonlinear Optics

History
Original Manuscript: December 4, 2006
Revised Manuscript: February 9, 2007
Manuscript Accepted: February 9, 2007
Published: April 17, 2007

Citation
D. S. Stoker, J. W. Keto, J. Baek, M. F. Becker, and J. Ma, "Resonant frequency-domain interferometry via third-harmonic generation," Opt. Lett. 32, 1265-1267 (2007)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-32-10-1265


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