Silicon nanowire grid polarizer for very deep ultraviolet fabricated from a shear-aligned diblock copolymer template
Optics Letters, Vol. 32, Issue 21, pp. 3125-3127 (2007)
http://dx.doi.org/10.1364/OL.32.003125
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Abstract
A silicon (Si) nanowire grid ultraviolet (UV) transmission polarizer has been fabricated, and its performance was measured over the visible to deep UV range. A cylinder-forming polystyrene-b-poly(hexylmethacrylate) diblock copolymer was coated onto an amorphous Si layer supported on a fused silica substrate, then shear aligned and employed as a mask for reactive-ion etching, resulting in a Si grid of
© 2007 Optical Society of America
OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(120.7000) Instrumentation, measurement, and metrology : Transmission
(230.5440) Optical devices : Polarization-selective devices
(260.5430) Physical optics : Polarization
(220.4241) Optical design and fabrication : Nanostructure fabrication
(310.6628) Thin films : Subwavelength structures, nanostructures
ToC Category:
Optical Design and Fabrication
History
Original Manuscript: August 1, 2007
Revised Manuscript: September 23, 2007
Manuscript Accepted: September 23, 2007
Published: October 22, 2007
Citation
Young-Rae Hong, Koji Asakawa, Douglas H. Adamson, Paul M. Chaikin, and Richard A. Register, "Silicon nanowire grid polarizer for very deep ultraviolet fabricated from a shear-aligned diblock copolymer template," Opt. Lett. 32, 3125-3127 (2007)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-32-21-3125
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