Abstract
We demonstrated a long waveguide array on a poly(methyl methacrylate) sheet fabricated by silicon hard-molding technology. To reduce the silicon sidewall roughness, a wet-oxidation followed by a buffered oxidation etchant etching process is adopted, achieving a surface roughness of . The waveguide obtained a total insertion loss of and an adjacent channel cross talk below . The optical bandwidth is determined to be by the optical autocorrelation method.
© 2007 Optical Society of America
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