Smallest lithographic marks generated by optical focusing systems
Optics Letters, Vol. 32, Issue 8, pp. 976-978 (2007)
http://dx.doi.org/10.1364/OL.32.000976
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Abstract
We show that the combination of Bessel beams and photosensitive materials exhibiting polarization filtering properties allows one to reach the smallest mark that can be lithographically generated by focusing systems. This property is of interest in current optical data storage techniques.
© 2007 Optical Society of America
OCIS Codes
(210.0210) Optical data storage : Optical data storage
(220.3740) Optical design and fabrication : Lithography
(230.5440) Optical devices : Polarization-selective devices
(260.1960) Physical optics : Diffraction theory
(260.5430) Physical optics : Polarization
(310.6860) Thin films : Thin films, optical properties
ToC Category:
Physical Optics
History
Original Manuscript: November 27, 2006
Revised Manuscript: January 5, 2007
Manuscript Accepted: January 20, 2007
Published: March 19, 2007
Citation
T. Grosjean, D. Courjon, and C. Bainier, "Smallest lithographic marks generated by optical focusing systems," Opt. Lett. 32, 976-978 (2007)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-32-8-976
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