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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 33, Iss. 10 — May. 15, 2008
  • pp: 1153–1155

Ultrafast laser fabrication of submicrometer pores in borosilicate glass

Ran An, Jeffrey D. Uram, Erik C. Yusko, Kevin Ke, Michael Mayer, and Alan J. Hunt  »View Author Affiliations


Optics Letters, Vol. 33, Issue 10, pp. 1153-1155 (2008)
http://dx.doi.org/10.1364/OL.33.001153


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Abstract

We demonstrate rapid fabrication of submicrometer-diameter pores in borosilicate glass using femtosecond laser machining and subsequent wet-etch techniques. This approach allows direct and repeatable fabrication of high-quality pores with diameters of 400 800 nm . Such small pores coupled with the desirable electrical and chemical properties of glass enable sensitive resistive-pulse analysis to determine the size and concentration of macromolecules and nanoparticles. Plasma-enhanced chemical vapor deposition allows further reduction of pore diameters to below 300 nm .

© 2008 Optical Society of America

OCIS Codes
(190.7110) Nonlinear optics : Ultrafast nonlinear optics
(230.4000) Optical devices : Microstructure fabrication
(350.3390) Other areas of optics : Laser materials processing

ToC Category:
Nonlinear Optics

History
Original Manuscript: January 25, 2008
Revised Manuscript: April 10, 2008
Manuscript Accepted: April 13, 2008
Published: May 14, 2008

Citation
Ran An, Jeffrey D. Uram, Erik C. Yusko, Kevin Ke, Michael Mayer, and Alan J. Hunt, "Ultrafast laser fabrication of submicrometer pores in borosilicate glass," Opt. Lett. 33, 1153-1155 (2008)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-33-10-1153


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