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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 33, Iss. 13 — Jul. 1, 2008
  • pp: 1434–1436

Contrast in four-beam-interference lithography

Justin L. Stay and Thomas K. Gaylord  »View Author Affiliations


Optics Letters, Vol. 33, Issue 13, pp. 1434-1436 (2008)
http://dx.doi.org/10.1364/OL.33.001434


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Abstract

Specific configurations of four linearly polarized, monochromatic plane waves have previously been shown to be capable of producing interference patterns exhibiting the symmetries inherent in all 14 Bravais lattices. We present (1) the range of possible absolute contrasts, (2) the conditions for unity absolute contrast, and (3) the types of interference patterns possible for configurations of four beams interference that satisfy the uniform contrast condition. Results are presented for three Bravais lattice structures: Base- and face-centered cubic and simple cubic.

© 2008 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(110.3960) Imaging systems : Microlithography
(220.3740) Optical design and fabrication : Lithography
(110.4235) Imaging systems : Nanolithography
(350.4238) Other areas of optics : Nanophotonics and photonic crystals
(050.5298) Diffraction and gratings : Photonic crystals

ToC Category:
Imaging Systems

History
Original Manuscript: March 17, 2008
Revised Manuscript: May 1, 2008
Manuscript Accepted: May 6, 2008
Published: June 23, 2008

Citation
Justin L. Stay and Thomas K. Gaylord, "Contrast in four-beam-interference lithography," Opt. Lett. 33, 1434-1436 (2008)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-33-13-1434


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