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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 33, Iss. 13 — Jul. 1, 2008
  • pp: 1515–1517

Optimized free-form phase mask for extension of depth of field in wavefront-coded imaging

Yasuhisa Takahashi and Shinichi Komatsu  »View Author Affiliations


Optics Letters, Vol. 33, Issue 13, pp. 1515-1517 (2008)
http://dx.doi.org/10.1364/OL.33.001515


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Abstract

To achieve a further extension of the depth of field in wavefront-coded imaging by reducing the impact of focus error in the optical transfer function, we propose the use of a free-form phase mask (FPM) instead of a conventional cubic phase mask (CPM). We optimized the shape of the FPM using the simulated annealing algorithm and confirmed that the optimized FPM provides a much larger focal tolerance and better final images than the CPM in the noise-free case.

© 2008 Optical Society of America

OCIS Codes
(070.0070) Fourier optics and signal processing : Fourier optics and signal processing
(110.0110) Imaging systems : Imaging systems
(220.0220) Optical design and fabrication : Optical design and fabrication
(230.0230) Optical devices : Optical devices
(260.0260) Physical optics : Physical optics

ToC Category:
Fourier Optics and Signal Processing

History
Original Manuscript: March 28, 2008
Revised Manuscript: May 29, 2008
Manuscript Accepted: June 1, 2008
Published: June 27, 2008

Citation
Yasuhisa Takahashi and Shinichi Komatsu, "Optimized free-form phase mask for extension of depth of field in wavefront-coded imaging," Opt. Lett. 33, 1515-1517 (2008)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-33-13-1515


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