Fabrication of 50 nm period gratings with multilevel interference lithography
Optics Letters, Vol. 33, Issue 14, pp. 1572-1574 (2008)
http://dx.doi.org/10.1364/OL.33.001572
Enhanced HTML 
Acrobat PDF (484 KB)
Abstract
We have developed a multilevel interference lithography process to fabricate
© 2008 Optical Society of America
OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(110.4235) Imaging systems : Nanolithography
(220.4241) Optical design and fabrication : Nanostructure fabrication
ToC Category:
Diffraction and Gratings
History
Original Manuscript: April 24, 2008
Revised Manuscript: June 4, 2008
Manuscript Accepted: June 5, 2008
Published: July 10, 2008
Citation
Chih-Hao Chang, Y. Zhao, R. K. Heilmann, and M. L. Schattenburg, "Fabrication of 50 nm period gratings with multilevel interference lithography," Opt. Lett. 33, 1572-1574 (2008)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-33-14-1572
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
Related Journal Articles 
- Silicon nanowire grid polarizer for very deep ultraviolet fabricated from a shear-aligned diblock copolymer template (OL)
- 4X reduction extreme ultraviolet interferometric lithography (OE)
- Biomimetic subwavelength antireflective gratings on GaAs (OL)
- Size-dependent behaviors of femtosecond laser-prototyped polymer micronanowires (OL)
- Complex periodic micro/nanostructures on 6H-SiC crystal induced by the interference of three femtosecond laser beams (OL)
Related Conference Papers
- Multisolitons in dispersion management with fibre Bragg gratings
- Multisolitons in dispersion management with fibre Bragg gratings
- Sub-10nm Nanolithography and Direct Pattern Transfer on III-V Compound Semiconductor Using Sol-Gel Derived ZrO2
- Sub-10nm Nanolithography and Direct Pattern Transfer on III-V Compound Semiconductor Using Sol-Gel Derived ZrO2
- Sculpting Nanostructures with Light
- Cross-Sectional Geometry Control of Low-Loss Biconical Fiber Tapers Using Hydrofluoric Acid Flow Etching
- Cross-Sectional Geometry Control of Low-Loss Biconical Fiber Tapers Using Hydrofluoric Acid Flow Etching
« Previous Article | Next Article »
OSA is a member of 