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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 33, Iss. 15 — Aug. 1, 2008
  • pp: 1653–1655

Optical characterization of wiregrid micropolarizers designed for infrared imaging polarimetry

Zhi Wu, Peter E. Powers, Andrew M. Sarangan, and Qiwen Zhan  »View Author Affiliations

Optics Letters, Vol. 33, Issue 15, pp. 1653-1655 (2008)

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We report the optical characterization of a metal wiregrid micropolarizer array for IR imaging polarimetry. The micropolarizers are designed for operation in the 1.5 5.0 μ m band with a specially designed thin Si O 2 layer between the silicon substrate and the wiregrids to improve the performance at the shorter wavelengths. Deep-UV projection lithography is used to fabricate 140 - nm -deep wiregrids with a 400 nm period. The extinction ratio and the transmission coefficient are measured with a tunable IR laser. A TM transmission coefficient greater than 70% with an extinction ratio greater than 10 4 is achieved for the midwave-IR region while maintaining an extinction ratio better than 10 2 for the near-IR region above 1.5 μ m .

© 2008 Optical Society of America

OCIS Codes
(050.1940) Diffraction and gratings : Diffraction
(120.0280) Instrumentation, measurement, and metrology : Remote sensing and sensors
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Diffraction and Gratings

Original Manuscript: June 19, 2008
Revised Manuscript: June 26, 2008
Manuscript Accepted: June 26, 2008
Published: July 21, 2008

Zhi Wu, Peter E. Powers, Andrew M. Sarangan, and Qiwen Zhan, "Optical characterization of wiregrid micropolarizers designed for infrared imaging polarimetry," Opt. Lett. 33, 1653-1655 (2008)

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