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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 33, Iss. 17 — Sep. 1, 2008
  • pp: 1990–1992

Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis

Ravikiran Attota, Thomas A. Germer, and Richard M. Silver  »View Author Affiliations

Optics Letters, Vol. 33, Issue 17, pp. 1990-1992 (2008)

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We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope, by analyzing through-focus scanning-optical-microscope images obtained at different focus positions. In principle, this technique can be used to identify which dimension is changing between two nanosized targets and to determine the dimension using a library-matching method. This methodology has potential utility for a wide range of target geometries and application areas, including nanometrology, nanomanufacturing, semiconductor process control, and biotechnology.

© 2008 Optical Society of America

OCIS Codes
(100.6640) Image processing : Superresolution
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.4630) Instrumentation, measurement, and metrology : Optical inspection
(180.5810) Microscopy : Scanning microscopy
(150.1835) Machine vision : Defect understanding
(150.5495) Machine vision : Process monitoring and control

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: May 30, 2008
Manuscript Accepted: June 23, 2008
Published: August 27, 2008

Virtual Issues
Vol. 3, Iss. 11 Virtual Journal for Biomedical Optics

Ravikiran Attota, Thomas A. Germer, and Richard M. Silver, "Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis," Opt. Lett. 33, 1990-1992 (2008)

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  1. Instrumentation and Metrology for Nanotechnology, Report of the National Nanotechnology Initiative (2004), http://www.nano.gov/NNI_Instrumentation_Metrology_rpt.pdf.
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