Conformal dielectric overlayers for engineering dispersion and effective nonlinearity of silicon nanophotonic wires
Optics Letters, Vol. 33, Issue 24, pp. 2889-2891 (2008)
http://dx.doi.org/10.1364/OL.33.002889
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Abstract
We introduce and study numerically a method for dispersion engineering of Si nanophotonic wires using a thin conformal silicon nitride film deposited around the Si core. Simulations show that this approach may be used to achieve the dispersion characteristics required for broadband, phase-matched, four-wave mixing processes, while simultaneously maintaining strong modal confinement within the Si core for high effective nonlinearity.
© 2008 Optical Society of America
OCIS Codes
(130.4310) Integrated optics : Nonlinear
(190.4380) Nonlinear optics : Nonlinear optics, four-wave mixing
(230.7370) Optical devices : Waveguides
ToC Category:
Nonlinear Optics
History
Original Manuscript: September 3, 2008
Revised Manuscript: October 19, 2008
Manuscript Accepted: October 22, 2008
Published: December 3, 2008
Citation
Xiaoping Liu, William M. J. Green, Xiaogang Chen, I-Wei Hsieh, Jerry I. Dadap, Yurii A. Vlasov, and Richard M. Osgood, Jr., "Conformal dielectric overlayers for engineering dispersion and effective nonlinearity of silicon nanophotonic wires," Opt. Lett. 33, 2889-2891 (2008)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-33-24-2889
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