We introduce and study numerically a method for dispersion engineering of Si nanophotonic wires using a thin conformal silicon nitride film deposited around the Si core. Simulations show that this approach may be used to achieve the dispersion characteristics required for broadband, phase-matched, four-wave mixing processes, while simultaneously maintaining strong modal confinement within the Si core for high effective nonlinearity.
© 2008 Optical Society of America
Original Manuscript: September 3, 2008
Revised Manuscript: October 19, 2008
Manuscript Accepted: October 22, 2008
Published: December 3, 2008
Xiaoping Liu, William M. J. Green, Xiaogang Chen, I-Wei Hsieh, Jerry I. Dadap, Yurii A. Vlasov, and Richard M. Osgood, Jr., "Conformal dielectric overlayers for engineering dispersion and effective nonlinearity of silicon nanophotonic wires," Opt. Lett. 33, 2889-2891 (2008)