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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 33, Iss. 24 — Dec. 15, 2008
  • pp: 3013–3015

Chip-scale dispersion engineering using chirped vertical gratings

D. T.H. Tan, K. Ikeda, R. E. Saperstein, B. Slutsky, and Y. Fainman  »View Author Affiliations


Optics Letters, Vol. 33, Issue 24, pp. 3013-3015 (2008)
http://dx.doi.org/10.1364/OL.33.003013


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Abstract

A strongly coupled, chirped Bragg grating made by sinusoidally modulating the sidewalls of a silicon waveguide is designed, fabricated, and experimentally characterized. By varying the device parameters, the operating wavelength, device bandwidth, sign (normal or anomalous), and magnitude of group-velocity dispersion may be engineered for specific photonic applications. Asymmetric Blackman apodization is best suited for maximizing the useable bandwidth while providing good ripple suppression. Dispersion values up to 7.0 × 10 5 ps nm km are demonstrated at 1.55 μ m .

© 2008 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(130.2035) Integrated optics : Dispersion compensation devices

ToC Category:
Integrated Optics

History
Original Manuscript: August 5, 2008
Revised Manuscript: November 6, 2008
Manuscript Accepted: November 7, 2008
Published: December 12, 2008

Citation
D. T. H. Tan, K. Ikeda, R. E. Saperstein, B. Slutsky, and Y. Fainman, "Chip-scale dispersion engineering using chirped vertical gratings," Opt. Lett. 33, 3013-3015 (2008)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-33-24-3013


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