High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region
Optics Letters, Vol. 33, Issue 5, pp. 485-487 (2008)
http://dx.doi.org/10.1364/OL.33.000485
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Abstract
We describe a simple method to fabricate blazed gratings used in the extreme ultraviolet wavelength region. The method uses an argon and oxygen mixed-gas ion beam to directly etch the grating substrate through a rectangular profile photoresist grating mask. With this method the etched grating groove profile can be well controlled. An
© 2008 Optical Society of America
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(310.1620) Thin films : Interference coatings
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: December 4, 2007
Revised Manuscript: January 21, 2008
Manuscript Accepted: January 27, 2008
Published: February 27, 2008
Citation
Hui Lin, Lichao Zhang, Lifeng Li, Chunshui Jin, Hongjun Zhou, and Tonglin Huo, "High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region," Opt. Lett. 33, 485-487 (2008)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-33-5-485
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