Spectral-purity-enhancing layer for multilayer mirrors
Optics Letters, Vol. 33, Issue 6, pp. 560-562 (2008)
http://dx.doi.org/10.1364/OL.33.000560
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Abstract
We demonstrate, both theoretically and experimentally, that special spectral-purity-enhancing multilayer mirror systems can be designed and fabricated to substantially reduce the level of out-of-band radiation expected in an extreme ultraviolet lithographic tool. A first proof of principle of applying such spectral-purity-enhancement layers showed reduced out-of-band reflectance by a factor of five, while the in-band reflectance is only 4.5% (absolute) less than for a standard capped multilayer.
© 2008 Optical Society of America
OCIS Codes
(310.1210) Thin films : Antireflection coatings
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(350.2460) Other areas of optics : Filters, interference
(310.4165) Thin films : Multilayer design
ToC Category:
X-ray Optics
History
Original Manuscript: November 7, 2007
Revised Manuscript: January 29, 2008
Manuscript Accepted: January 30, 2008
Published: March 11, 2008
Citation
M. M. J. W. van Herpen, R. W. E. van de Kruijs, D. J. W. Klunder, E. Louis, A. E. Yakshin, S. Alonso van der Westen, F. Bijkerk, and V. Banine, "Spectral-purity-enhancing layer for multilayer mirrors," Opt. Lett. 33, 560-562 (2008)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-33-6-560
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