Fabrication of micromodel grid for various moiré methods by femtosecond laser exposure
Optics Letters, Vol. 34, Issue 1, pp. 112-114 (2009)
http://dx.doi.org/10.1364/OL.34.000112
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Abstract
The femtosecond laser exposure system was used to fabricate model grids for the charge-coupled device (CCD) moiré method, scanning laser moiré method, and electron moiré method for microstrain deformation measurements. The femtosecond laser exposure produces mesoscopic variation patterns on the surface. These variation patterns make the grid in the scanning laser microscope and CCD images darker and make the grid in the scanning electron microscope image brighter. The CCD moiré fringe, scanning laser moiré fringe, and electron moiré fringe consisting of bright and dark lines were generated. As a demonstration, microstrain distribution of the three-point bending tested specimen was measured.
© 2008 Optical Society of America
OCIS Codes
(120.4120) Instrumentation, measurement, and metrology : Moire' techniques
(140.3295) Lasers and laser optics : Laser beam characterization
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: September 26, 2008
Revised Manuscript: November 21, 2008
Manuscript Accepted: November 22, 2008
Published: December 31, 2008
Citation
Satoshi Kishimoto, Yoshihisa Tanaka, Toru Tomimatsu, Yutaka Kagawa, and Kotobu Nagai, "Fabrication of micromodel grid for various moiré methods by femtosecond laser exposure," Opt. Lett. 34, 112-114 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-1-112
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