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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 34, Iss. 1 — Jan. 1, 2009
  • pp: 40–42

Phase Fresnel lens recorded in photo-thermo-refractive glass by selective exposure to infrared ultrashort laser pulses

Leo A. Siiman, Julien Lumeau, and Leonid B. Glebov  »View Author Affiliations


Optics Letters, Vol. 34, Issue 1, pp. 40-42 (2009)
http://dx.doi.org/10.1364/OL.34.000040


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Abstract

A new two-step approach for fabricating phase optical elements in photo-thermo-refractive glass by exposure to IR ultrashort laser pulses followed by thermal development is shown. A binary phase Fresnel lens was designed to focus light at 632.8 nm to a focal length of 400 cm . Conditions of ultrashort pulse irradiation and thermal development were chosen to achieve π phase shift between zone boundaries. The focusing efficiency of the element was measured to be close to 50%.

© 2008 Optical Society of America

OCIS Codes
(050.5080) Diffraction and gratings : Phase shift
(050.1965) Diffraction and gratings : Diffractive lenses
(160.5335) Materials : Photosensitive materials

ToC Category:
Diffraction and Gratings

History
Original Manuscript: August 28, 2008
Revised Manuscript: November 17, 2008
Manuscript Accepted: November 18, 2008
Published: December 23, 2008

Citation
Leo A. Siiman, Julien Lumeau, and Leonid B. Glebov, "Phase Fresnel lens recorded in photo-thermo-refractive glass by selective exposure to infrared ultrashort laser pulses," Opt. Lett. 34, 40-42 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-1-40


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