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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 34, Iss. 1 — Jan. 1, 2009
  • pp: 70–72

Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication

Qi Wang, Dawei Zhang, Hongbo He, Yuanshen Huang, JiaBi Chen, Lin Chen, Yiming Zhu, and Songlin Zhuang  »View Author Affiliations


Optics Letters, Vol. 34, Issue 1, pp. 70-72 (2009)
http://dx.doi.org/10.1364/OL.34.000070


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Abstract

Unless the fabrication error control is well treated, it easily causes overetched fabrication errors, which causes the resonant peak value deviation during the fabrication process of guided-mode resonant filters (GMRFs). Hence, the fabrication error control becomes a key point for improving the performance of GMRF. We find that, within the range of the groove depth from 93 to 105 ‚ÄČ nm , the relationship between the overetched error and the resonant peak value deviation is nearly linear, which means that we can compensate the reflectance response deviation and reduce the resonant peak value deviation by the method of covering the layer film on the GMRF. Simulation results show that the deviation is compensated perfectly by this way.

© 2008 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(310.2790) Thin films : Guided waves

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: August 26, 2008
Revised Manuscript: November 9, 2008
Manuscript Accepted: November 20, 2008
Published: December 24, 2008

Citation
Qi Wang, Dawei Zhang, Hongbo He, Yuanshen Huang, JiaBi Chen, Lin Chen, Yiming Zhu, and Songlin Zhuang, "Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication," Opt. Lett. 34, 70-72 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-1-70

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