Closely packed and aspect-ratio-controlled antireflection subwavelength gratings on GaAs using a lenslike shape transfer
Optics Letters, Vol. 34, Issue 11, pp. 1702-1704 (2009)
http://dx.doi.org/10.1364/OL.34.001702
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Abstract
We report a simple and low-cost fabrication of antireflection subwavelength grating (SWG) structures on GaAs using the lenslike shape transfer by a holographic lithography and a reflowed photoresist mask. The use of an additional thermal reflow process enhances the close packing of two-dimensional SWGs with a conical shape. The aspect ratio of conical SWG was also controlled easily by adjusting the rf power during the dry etch process. The fabricated SWGs exhibited low reflection properties over a wide spectral range, in agreement with the calculated values using by a rigorous coupled-wave analysis simulation.
© 2009 Optical Society of America
OCIS Codes
(220.4241) Optical design and fabrication : Nanostructure fabrication
(050.6624) Diffraction and gratings : Subwavelength structures
(260.2710) Physical optics : Inhomogeneous optical media
ToC Category:
Diffraction and Gratings
History
Original Manuscript: January 5, 2009
Revised Manuscript: April 16, 2009
Manuscript Accepted: April 17, 2009
Published: May 28, 2009
Citation
Young Min Song, Si Young Bae, Jae Su Yu, and Yong Tak Lee, "Closely packed and aspect-ratio-controlled antireflection subwavelength gratings on GaAs using a lenslike shape transfer," Opt. Lett. 34, 1702-1704 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-11-1702
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