OSA's Digital Library

Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 34, Iss. 12 — Jun. 15, 2009
  • pp: 1783–1785

Three-beam interference lithography: upgrading a Lloyd’s interferometer for single-exposure hexagonal patterning

Johannes de Boor, Nadine Geyer, Ulrich Gösele, and Volker Schmidt  »View Author Affiliations


Optics Letters, Vol. 34, Issue 12, pp. 1783-1785 (2009)
http://dx.doi.org/10.1364/OL.34.001783


View Full Text Article

Enhanced HTML    Acrobat PDF (363 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

Three-beam interference lithography is used to create hole/dot photoresist patterns with hexagonal symmetry. This is achieved by modifying a standard two-beam Lloyd’s mirror interferometer into a three-beam interferometer, with the position of the mirrors chosen to guarantee 120° symmetry of exposure. Compared to commonly used three-beam setups, this brings the advantage of simplified alignment, as the position of the mirrors with respect to the substrate is fixed. Pattern periodicities from several wavelengths λ down to 2 3 λ are thus easily and continuously accessible by simply rotating the three-beam interferometer. Furthermore, in contrast to standard Lloyd’s interferometers, only a single exposure is needed to create hole/dot photoresist patterns.

© 2009 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(220.3740) Optical design and fabrication : Lithography
(260.3160) Physical optics : Interference
(220.2945) Optical design and fabrication : Illumination design
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: March 17, 2009
Revised Manuscript: April 15, 2009
Manuscript Accepted: April 18, 2009
Published: June 3, 2009

Citation
Johannes de Boor, Nadine Geyer, Ulrich Gösele, and Volker Schmidt, "Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning," Opt. Lett. 34, 1783-1785 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-12-1783


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. S. R. J. Brueck, Proc. IEEE 93, 1704 (2005). [CrossRef]
  2. W. Lee, R. Ji, C. Ross, U. Gösele, and K. Nielsch, Small 2, 978 (2006). [CrossRef] [PubMed]
  3. R. Ji, W. Lee, R. Scholz, U. Gösele, and K. Nielsch, Adv. Mater. 18, 2593 (2006). [CrossRef]
  4. U. Drodofsky, J. Stuhler, T. Schulze, M. Drewsen, B. Brezger, T. Pfau, and J. Mlynek, Appl. Phys. B 65, 755 (1997). [CrossRef]
  5. A. Lasagni, D. Acevedo, C. Barbero, and F. Mücklich, Adv. Eng. Mater. 9, 99 (2007). [CrossRef]
  6. N. Kramer, M. Niesten, and C. Schönenberger, Appl. Phys. Lett. 67, 2989 (1995). [CrossRef]
  7. J. Martín, J. Nogués, K. Liu, J. Vicente, and I. K. Schuller, J. Magn. Magn. Mater. 256, 449 (2003). [CrossRef]
  8. W. K. Choi, T. H. Liew, M. K. Dawood, H. I. Smith, C. V. Thompson, and M. H. Hong, Nano Lett. 8, 3799 (2008). [CrossRef] [PubMed]
  9. J. Moon, J. Ford, and S. Yang, Polym. Adv. Technol. 17, 83 (2006). [CrossRef]
  10. C. Lu, X. K. Hu, S. S. Dimov, and R. H. Lipson, Appl. Opt. 46, 7202 (2007). [CrossRef] [PubMed]
  11. M. E. Walsh, Ph.D. thesis (Massachusetts Institute of Technology, 2004).
  12. N. D. Lai, W. P. Liang, J. H. Lin, C. C. Hsu, and C. H. Lin, Opt. Express 13, 9605 (2005). [CrossRef] [PubMed]
  13. J. L. Stay and T. K. Gaylord, Appl. Opt. 47, 3221 (2008). [CrossRef] [PubMed]
  14. C. L. Haynes and R. P. V. Duyne, J. Phys. Chem. B 105, 5599 (2001). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

Figures

Fig. 1 Fig. 2 Fig. 3
 
Fig. 4
 

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited