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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 34, Iss. 12 — Jun. 15, 2009
  • pp: 1783–1785

Three-beam interference lithography: upgrading a Lloyd’s interferometer for single-exposure hexagonal patterning

Johannes de Boor, Nadine Geyer, Ulrich Gösele, and Volker Schmidt  »View Author Affiliations


Optics Letters, Vol. 34, Issue 12, pp. 1783-1785 (2009)
http://dx.doi.org/10.1364/OL.34.001783


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Abstract

Three-beam interference lithography is used to create hole/dot photoresist patterns with hexagonal symmetry. This is achieved by modifying a standard two-beam Lloyd’s mirror interferometer into a three-beam interferometer, with the position of the mirrors chosen to guarantee 120° symmetry of exposure. Compared to commonly used three-beam setups, this brings the advantage of simplified alignment, as the position of the mirrors with respect to the substrate is fixed. Pattern periodicities from several wavelengths λ down to 2 3 λ are thus easily and continuously accessible by simply rotating the three-beam interferometer. Furthermore, in contrast to standard Lloyd’s interferometers, only a single exposure is needed to create hole/dot photoresist patterns.

© 2009 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(220.3740) Optical design and fabrication : Lithography
(260.3160) Physical optics : Interference
(220.2945) Optical design and fabrication : Illumination design
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: March 17, 2009
Revised Manuscript: April 15, 2009
Manuscript Accepted: April 18, 2009
Published: June 3, 2009

Citation
Johannes de Boor, Nadine Geyer, Ulrich Gösele, and Volker Schmidt, "Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning," Opt. Lett. 34, 1783-1785 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-12-1783

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