Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning
Optics Letters, Vol. 34, Issue 12, pp. 1783-1785 (2009)
http://dx.doi.org/10.1364/OL.34.001783
Enhanced HTML 
Acrobat PDF (363 KB)
Abstract
Three-beam interference lithography is used to create hole/dot photoresist patterns with hexagonal symmetry. This is achieved by modifying a standard two-beam Lloyd’s mirror interferometer into a three-beam interferometer, with the position of the mirrors chosen to guarantee 120° symmetry of exposure. Compared to commonly used three-beam setups, this brings the advantage of simplified alignment, as the position of the mirrors with respect to the substrate is fixed. Pattern periodicities from several wavelengths λ down to
© 2009 Optical Society of America
OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(220.3740) Optical design and fabrication : Lithography
(260.3160) Physical optics : Interference
(220.2945) Optical design and fabrication : Illumination design
(220.4241) Optical design and fabrication : Nanostructure fabrication
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: March 17, 2009
Revised Manuscript: April 15, 2009
Manuscript Accepted: April 18, 2009
Published: June 3, 2009
Citation
Johannes de Boor, Nadine Geyer, Ulrich Gösele, and Volker Schmidt, "Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning," Opt. Lett. 34, 1783-1785 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-12-1783
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
Related Journal Articles 
- Design of holographic structures using genetic algorithms (OE)
- Inverse design for phase mask lithography (OE)
- Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd’s interferometer (OL)
- Two degrees-of-freedom Lloyd–mirror interferometer for superior pattern coverage area (OL)
- Tunable two-mirror interference lithography system for wafer-scale nanopatterning (OL)
Related Conference Papers
- ing interferometry with a single-element phase-shifting interferometer
- Signal Analysis of Optical Frequency-Modulated Continuous-Wave Interference
- Signal Analysis of Optical Frequency-Modulated Continuous-Wave Interference
- Optical Frequency-Modulated Continuous-Wave Interferometers and Their Applications
- Signal Analysis of Optical Frequency-Modulated Continuous-Wave Interference
« Previous Article | Next Article »
OSA is a member of 