Control of thermal deformation in dielectric mirrors using mechanical design and atomic layer deposition
Optics Letters, Vol. 34, Issue 13, pp. 1958-1960 (2009)
http://dx.doi.org/10.1364/OL.34.001958
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Abstract
A mechanical design technique for optical coatings that simultaneously controls thermal deformation and optical reflectivity is reported. The method requires measurement of the refractive index and thermal stress of single films prior to the design. Atomic layer deposition was used for deposition because of the high repeatability of the film constants. An
© 2009 Optical Society of America
OCIS Codes
(230.1480) Optical devices : Bragg reflectors
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.4165) Thin films : Multilayer design
ToC Category:
Thin Films
History
Original Manuscript: March 18, 2009
Revised Manuscript: May 21, 2009
Manuscript Accepted: May 26, 2009
Published: June 23, 2009
Citation
Nicholas T. Gabriel, Sangho S. Kim, and Joseph J. Talghader, "Control of thermal deformation in dielectric mirrors using mechanical design and atomic layer deposition," Opt. Lett. 34, 1958-1960 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-13-1958
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