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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 34, Iss. 13 — Jul. 1, 2009
  • pp: 1958–1960

Control of thermal deformation in dielectric mirrors using mechanical design and atomic layer deposition

Nicholas T. Gabriel, Sangho S. Kim, and Joseph J. Talghader  »View Author Affiliations


Optics Letters, Vol. 34, Issue 13, pp. 1958-1960 (2009)
http://dx.doi.org/10.1364/OL.34.001958


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Abstract

A mechanical design technique for optical coatings that simultaneously controls thermal deformation and optical reflectivity is reported. The method requires measurement of the refractive index and thermal stress of single films prior to the design. Atomic layer deposition was used for deposition because of the high repeatability of the film constants. An Al 2 O 3 / HfO 2 distributed Bragg reflector was deposited with a predicted peak reflectivity of 87.9% at 542.4 nm and predicted edge deformation of −360 nm/K on a 10 cm silicon substrate. The measured peak reflectivity was 85.7% at 541.7 nm with an edge deformation of −346 nm/K.

© 2009 Optical Society of America

OCIS Codes
(230.1480) Optical devices : Bragg reflectors
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

History
Original Manuscript: March 18, 2009
Revised Manuscript: May 21, 2009
Manuscript Accepted: May 26, 2009
Published: June 23, 2009

Citation
Nicholas T. Gabriel, Sangho S. Kim, and Joseph J. Talghader, "Control of thermal deformation in dielectric mirrors using mechanical design and atomic layer deposition," Opt. Lett. 34, 1958-1960 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-13-1958


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References

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