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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 34, Iss. 17 — Sep. 1, 2009
  • pp: 2661–2663

Spectral interferometric technique to measure the ellipsometric phase of a thin-film structure

Petr Hlubina, Dalibor Ciprian, and Jiri Lunacek  »View Author Affiliations


Optics Letters, Vol. 34, Issue 17, pp. 2661-2663 (2009)
http://dx.doi.org/10.1364/OL.34.002661


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Abstract

A two-step white-light spectral interferometric technique is used to retrieve the ellipsometric phase of a thin-film structure from the spectral interferograms recorded in a polarimetry configuration with a birefringent crystal. In the first step, the phase difference between p- and s-polarized waves propagating in the crystal alone is retrieved. In the second step, the additional phase change that the polarized waves undergo on reflection from the thin-film structure is retrieved. The new method is used in determining the thin-film thickness from ellipsometric phase measured for Si O 2 thin film on a Si substrate in a range from 550 to 900 nm . The thicknesses of three different samples obtained are compared with those resulting from polarimetric measurements, and good agreement is confirmed.

© 2009 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(120.5410) Instrumentation, measurement, and metrology : Polarimetry
(120.5700) Instrumentation, measurement, and metrology : Reflection
(240.0310) Optics at surfaces : Thin films

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: July 6, 2009
Manuscript Accepted: August 2, 2009
Published: August 27, 2009

Citation
Petr Hlubina, Dalibor Ciprian, and Jiri Lunacek, "Spectral interferometric technique to measure the ellipsometric phase of a thin-film structure," Opt. Lett. 34, 2661-2663 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-17-2661


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References

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