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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 34, Iss. 18 — Sep. 15, 2009
  • pp: 2820–2822

Laser direct writing of nanoreliefs in Sn nanofilms

Chuan Fei Guo, Zhuwei Zhang, Sihai Cao, and Qian Liu  »View Author Affiliations

Optics Letters, Vol. 34, Issue 18, pp. 2820-2822 (2009)

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High-resolution ( 200 nm ) nanoreliefs, which possess a controllable height change ( Δ h , up to film thickness) and transmittance or reflectance, have been successfully fabricated in 12 - nm -thick Sn films by using 532 nm pulsed laser direct writing. Different from current micro/nanofabrication techniques, the height change of the nanoreliefs is generated by a laser-induced-thickening process. The majority of the height change comes from a balling and coarsening effect rather than oxidation of grains. Because both optical density and Δ h of the nanoreliefs are almost linear to laser power, the optical images can highly resemble the topographic images. This technique is useful for fabricating complicated nanorelief structures and fine images.

© 2009 Optical Society of America

OCIS Codes
(220.4241) Optical design and fabrication : Nanostructure fabrication
(090.6186) Holography : Spectral holography
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Optical Design and Fabrication

Original Manuscript: May 15, 2009
Revised Manuscript: August 5, 2009
Manuscript Accepted: August 14, 2009
Published: September 10, 2009

Chuan Fei Guo, Zhuwei Zhang, Sihai Cao, and Qian Liu, "Laser direct writing of nanoreliefs in Sn nanofilms," Opt. Lett. 34, 2820-2822 (2009)

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