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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 34, Iss. 19 — Oct. 1, 2009
  • pp: 2921–2923

Nanoporous silicon multilayers for terahertz filtering

Shu-Zee A. Lo and Thomas E. Murphy  »View Author Affiliations

Optics Letters, Vol. 34, Issue 19, pp. 2921-2923 (2009)

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We describe the fabrication, simulation, and measurement of a terahertz (THz) filter composed of nanoporous silicon multilayers. Using electrochemical etching, we fabricated a structure composed of alternating high- and low-index layers that achieves 93% power reflectivity at the target wavelength of 1.17 THz, with a stopband of 0.26 THz. The measured reflection and transmission spectra of the multilayer filter show excellent agreement with calculations based on the refractive indices determined separately from single-layer measurements. This technique could provide a convenient, flexible, and economical way to produce THz filters, which are essential in a variety of future applications.

© 2009 Optical Society of America

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(230.1480) Optical devices : Bragg reflectors
(220.4241) Optical design and fabrication : Nanostructure fabrication
(300.6495) Spectroscopy : Spectroscopy, teraherz
(230.7408) Optical devices : Wavelength filtering devices

ToC Category:

Original Manuscript: July 21, 2009
Revised Manuscript: August 18, 2009
Manuscript Accepted: August 20, 2009
Published: September 18, 2009

Shu-Zee A. Lo and Thomas E. Murphy, "Nanoporous silicon multilayers for terahertz filtering," Opt. Lett. 34, 2921-2923 (2009)

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