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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 34, Iss. 19 — Oct. 1, 2009
  • pp: 3026–3028

Frequency-resolved high-harmonic wavefront characterization

E. Frumker, G. G. Paulus, H. Niikura, D. M. Villeneuve, and P. B. Corkum  »View Author Affiliations

Optics Letters, Vol. 34, Issue 19, pp. 3026-3028 (2009)

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We introduce and demonstrate a novel concept of frequency-resolved wavefront characterization. Our approach is particularly suitable for high-harmonic, extreme-UV (XUV) and soft X-ray radiation. The concept is based on an analysis of radiation diffracted from a slit scanned in front of a flat-field XUV spectrometer. With the spectrally resolved signal spread across one axis and the spatially resolved diffraction pattern in the other dimension, we reconstruct the wavefront. While demonstrated for high harmonics, the method is not restricted in wavelength.

© 2009 Optical Society of America

OCIS Codes
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(260.1960) Physical optics : Diffraction theory
(020.2649) Atomic and molecular physics : Strong field laser physics

ToC Category:
Atomic and Molecular Physics

Original Manuscript: August 11, 2009
Manuscript Accepted: August 23, 2009
Published: September 30, 2009

E. Frumker, G. G. Paulus, H. Niikura, D. M. Villeneuve, and P. B. Corkum, "Frequency-resolved high-harmonic wavefront characterization," Opt. Lett. 34, 3026-3028 (2009)

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