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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 34, Iss. 21 — Nov. 1, 2009
  • pp: 3340–3342

Enhancement of second-harmonic generation from silicon stripes under external cylindrical strain

Ji-Hong Zhao, Qi-Dai Chen, Zhan-Guo Chen, Gang Jia, Wen Su, Ying Jiang, Zhao-Xu Yan, T. V. Dolgova, O. A. Aktsipetrov, and Hong-Bo Sun  »View Author Affiliations


Optics Letters, Vol. 34, Issue 21, pp. 3340-3342 (2009)
http://dx.doi.org/10.1364/OL.34.003340


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Abstract

The enhanced second-harmonic (SH) generation from Si (111) stripes induced by external cylindrical strain is investigated. The dependence of the intensity of the strain-induced SH on the sample azimuth shows that the Si under cylindrical strain has 3 m symmetry, which is similar to that of the Si (111) surface. Further studies indicate that the intensity of the enhanced SH is a quadratic function of the cylindrical strain within the magnitude that the Si stripe can bear. For the p-polarized and s-polarized SH, the intensities are, respectively, enhanced by 47.9% and 13% at ϵ 0 = 2.93 × 10 4 . The enhancement of SH is due to the contributions from the strain-induced second-order nonlinear susceptibility χ strain ( 2 ) to the bulk dipole.

© 2009 Optical Society of America

OCIS Codes
(190.2620) Nonlinear optics : Harmonic generation and mixing
(190.4350) Nonlinear optics : Nonlinear optics at surfaces

ToC Category:
Nonlinear Optics

History
Original Manuscript: June 23, 2009
Revised Manuscript: September 22, 2009
Manuscript Accepted: October 1, 2009
Published: October 27, 2009

Citation
Ji-Hong Zhao, Qi-Dai Chen, Zhan-Guo Chen, Gang Jia, Wen Su, Ying Jiang, Zhao-Xu Yan, T. V. Dolgova, O. A. Aktsipetrov, and Hong-Bo Sun, "Enhancement of second-harmonic generation from silicon stripes under external cylindrical strain," Opt. Lett. 34, 3340-3342 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-21-3340


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