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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 34, Iss. 23 — Dec. 1, 2009
  • pp: 3680–3682

Extreme ultraviolet multilayer mirror with near-zero IR reflectance

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine  »View Author Affiliations

Optics Letters, Vol. 34, Issue 23, pp. 3680-3682 (2009)

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We have developed a multilayer mirror for extreme ultraviolet (EUV) radiation that has low reflectance for IR radiation at 10.6 μ m wavelength. The mirror is based on a multilayer coating comprising alternating layers of diamondlike carbon and silicon, for which we demonstrate an EUV reflectance of up to 49.7%. We have made a functional prototype in which the multilayer coating is included as part of an antireflection coating for IR radiation, resulting in reflectance values of 42.5% and 4.4% for EUV and IR, respectively. The mirror can replace a standard Mo/Si mirror in an EUV lithography tool to form an efficient solution for the suppression of unwanted CO 2 laser radiation.

© 2009 Optical Society of America

OCIS Codes
(230.1480) Optical devices : Bragg reflectors
(310.1210) Thin films : Antireflection coatings
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(310.4165) Thin films : Multilayer design
(230.7408) Optical devices : Wavelength filtering devices

ToC Category:
Thin Films

Original Manuscript: September 15, 2009
Revised Manuscript: October 13, 2009
Manuscript Accepted: October 16, 2009
Published: November 23, 2009

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine, "Extreme ultraviolet multilayer mirror with near-zero IR reflectance," Opt. Lett. 34, 3680-3682 (2009)

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