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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 34, Iss. 24 — Dec. 15, 2009
  • pp: 3800–3802

Monolithic double-grating phase mask for large-period highly coherent grating printing

Y. Bourgin, S. Bakkali, Y. Jourlin, S. Tonchev, and O. Parriaux  »View Author Affiliations


Optics Letters, Vol. 34, Issue 24, pp. 3800-3802 (2009)
http://dx.doi.org/10.1364/OL.34.003800


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Abstract

A monolithic double-grating phase mask comprising three short-pitch grating sections of spatial frequencies k 1 and k 2 collocated at one side of a substrate produces a large-period interferogram without higher harmonics to print in a photoresist film a latent grating of small spatial frequency equal to twice k 2 k 1 . When incorporated in a write-on-the-fly scheme, the elements permit the fabrication of unlimitedly long gratings.

© 2009 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Diffraction and Gratings

History
Original Manuscript: September 4, 2009
Revised Manuscript: November 3, 2009
Manuscript Accepted: November 4, 2009
Published: December 4, 2009

Citation
Y. Bourgin, S. Bakkali, Y. Jourlin, S. Tonchev, and O. Parriaux, "Monolithic double-grating phase mask for large-period highly coherent grating printing," Opt. Lett. 34, 3800-3802 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-24-3800


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References

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  2. J. Thiel and E. Spanner, in Proceedings of the EUSPEN (1999), pp. 419-422.
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