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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 34, Iss. 3 — Feb. 1, 2009
  • pp: 271–273

Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination

F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni  »View Author Affiliations


Optics Letters, Vol. 34, Issue 3, pp. 271-273 (2009)
http://dx.doi.org/10.1364/OL.34.000271


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Abstract

We report the demonstration of a reflection microscope that operates at 13.2 nm wavelength with a spatial resolution of 55 ± 3 nm . The microscope uses illumination from a tabletop extreme ultraviolet laser to acquire aerial images of photolithography masks with a 20 s exposure time. The modulation transfer function of the optical system was characterized.

© 2009 Optical Society of America

OCIS Codes
(110.7440) Imaging systems : X-ray imaging
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(180.7460) Microscopy : X-ray microscopy

ToC Category:
Microscopy

History
Original Manuscript: October 7, 2008
Manuscript Accepted: November 12, 2008
Published: January 26, 2009

Citation
F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, "Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination," Opt. Lett. 34, 271-273 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-3-271

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