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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 34, Iss. 3 — Feb. 1, 2009
  • pp: 383–385

Experimental demonstration of a cross-order echelle grating triplexer based on an amorphous silicon nanowire platform

Ning Zhu, Jun Song, Lech Wosinski, Sailing He, and Lars Thylen  »View Author Affiliations

Optics Letters, Vol. 34, Issue 3, pp. 383-385 (2009)

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We present the design, fabrication, and characterization of an ultracompact silicon-on-insulator-based echelle grating triplexer. It is based on the cross-order design, which utilizes different diffraction orders to cover a large spectral range from 1.3 to 1.5 μ m with three channels located at 1310, 1490, and 1550 nm and with a footprint of 150 μ m × 130 μ m .

© 2009 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(230.7408) Optical devices : Wavelength filtering devices

ToC Category:
Diffraction and Gratings

Original Manuscript: September 26, 2008
Revised Manuscript: December 9, 2008
Manuscript Accepted: December 10, 2008
Published: January 30, 2009

Ning Zhu, Jun Song, Lech Wosinski, Sailing He, and Lars Thylen, "Experimental demonstration of a cross-order echelle grating triplexer based on an amorphous silicon nanowire platform," Opt. Lett. 34, 383-385 (2009)

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