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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 34, Iss. 7 — Apr. 1, 2009
  • pp: 941–943

Submicrometer-resolution in situ imaging of the focus pattern of a soft x-ray laser by color center formation in LiF crystal

A. Ya. Faenov, Y. Kato, M. Tanaka, T. A. Pikuz, M. Kishimoto, M. Ishino, M. Nishikino, Y. Fukuda, S. V. Bulanov, and T. Kawachi  »View Author Affiliations

Optics Letters, Vol. 34, Issue 7, pp. 941-943 (2009)

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We demonstrate high quality, single-shot in situ imaging of the focused Ag x-ray laser (XRL) at 13.9 nm with 700 nm spatial resolution by color center formation in LiF. The flux and intensity for the color center formation in LiF are evaluated from the experimental data. Comparisons with previous reports show that the threshold x-ray flux for the color center formation in LiF for the 13.9 nm , 7 ps Ag XRL is 3 orders of magnitude less than that with the 46.9 nm , 2 ns capillary discharge Ar XRL.

© 2009 Optical Society of America

OCIS Codes
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(350.5400) Other areas of optics : Plasmas

ToC Category:
Lasers and Laser Optics

Original Manuscript: December 4, 2008
Revised Manuscript: February 15, 2009
Manuscript Accepted: February 16, 2009
Published: March 19, 2009

A. Ya. Faenov, Y. Kato, M. Tanaka, T. A. Pikuz, M. Kishimoto, M. Ishino, M. Nishikino, Y. Fukuda, S. V. Bulanov, and T. Kawachi, "Submicrometer-resolution in situ imaging of the focus pattern of a soft x-ray laser by color center formation in LiF crystal," Opt. Lett. 34, 941-943 (2009)

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