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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 34, Iss. 8 — Apr. 15, 2009
  • pp: 1147–1149

Vacuum–ultraviolet blazed silicon grating anisotropically etched by native-oxide mask

Bin Sheng, Xiangdong Xu, Ying Liu, Yilin Hong, Hongjun Zhou, Tonglin Huo, and Shaojun Fu  »View Author Affiliations

Optics Letters, Vol. 34, Issue 8, pp. 1147-1149 (2009)

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We describe a simple and convenient method of controlling the profile of a blazed grating that consists of using a patterned native-oxide layer of off-cut silicon (111) wafers as the mask of anisotropic etching to maximize the smooth blaze facets of the desired blaze angle and to minimize the deficiencies of the groove apexes. With the blazed-grating profile well controlled by this technique, a 1200 g mm blazed grating was fabricated that had a blaze angle of 5.0° and smooth blaze facets of about 0.2 nm rms. It was measured to have blaze efficiency in the vacuum–ultraviolet wavelength region.

© 2009 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(220.4610) Optical design and fabrication : Optical fabrication
(260.7210) Physical optics : Ultraviolet, vacuum

ToC Category:
Diffraction and Gratings

Original Manuscript: November 17, 2008
Revised Manuscript: January 19, 2009
Manuscript Accepted: February 25, 2009
Published: April 3, 2009

Bin Sheng, Xiangdong Xu, Ying Liu, Yilin Hong, Hongjun Zhou, Tonglin Huo, and Shaojun Fu, "Vacuum-ultraviolet blazed silicon grating anisotropically etched by native-oxide mask," Opt. Lett. 34, 1147-1149 (2009)

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