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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 34, Iss. 9 — May. 1, 2009
  • pp: 1360–1362

Characterization of metal oxide nanofilm morphologies and composition by terahertz transmission spectroscopy

Edwin J. Heilweil, James E. Maslar, William A. Kimes, Nabil D. Bassim, and Peter K. Schenck  »View Author Affiliations

Optics Letters, Vol. 34, Issue 9, pp. 1360-1362 (2009)

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An all-optical terahertz absorption technique for nondestructive characterization of nanometer-scale metal oxide thin films grown on silicon substrates is described. Example measurements of laser-deposited Ti O 2 and atomic layer-deposited films of Hf O 2 are presented to demonstrate applicability to pure Y 2 O 3 , Al 2 O 3 , and V O x and mixed combinatorial films as a function of deposition conditions and thickness. This technique is also found to be sensitive to Hf O 2 phonon modes in films with a nominal thickness of 5 nm .

© 2009 U.S. Government

OCIS Codes
(260.3090) Physical optics : Infrared, far
(310.3840) Thin films : Materials and process characterization
(310.6188) Thin films : Spectral properties
(300.6495) Spectroscopy : Spectroscopy, teraherz

ToC Category:
Thin Films

Original Manuscript: January 5, 2009
Revised Manuscript: March 22, 2009
Manuscript Accepted: March 22, 2009
Published: April 22, 2009

Edwin J. Heilweil, James E. Maslar, William A. Kimes, Nabil D. Bassim, and Peter K. Schenck, "Characterization of metal oxide nanofilm morphologies and composition by terahertz transmission spectroscopy," Opt. Lett. 34, 1360-1362 (2009)

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