The conventional approach for radiationless interference exploits the interference of evanescent components for the purpose of deep-subwavelength focusing and image formation. As a result, deep subwavelength feature size is achieved at the price of severe exponential decay of the field strength. We propose to overcome the limitation of the conventional approach by combining radiationless interference with evanescent field amplification as provided by the surface polaritons at the interface between positive- and negative-dielectric materials. Our approach removes the exponential decay and, moreover, allows a much wider range of wave vectors, including both propagating and evanescent field components, to participate in the image-formation process.
© 2010 Optical Society of America
Optics at Surfaces
Original Manuscript: January 15, 2010
Revised Manuscript: March 27, 2010
Manuscript Accepted: April 8, 2010
Published: May 7, 2010
Varat Intaraprasonk, Zongfu Yu, and Shanhui Fan, "Combining radiationless interference with evanescent field amplification," Opt. Lett. 35, 1659-1661 (2010)