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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 35, Iss. 13 — Jul. 1, 2010
  • pp: 2230–2232

Maskless photolithography via holographic optical projection

Christoph Bay, Nils Hübner, Jon Freeman, and Tim Wilkinson  »View Author Affiliations

Optics Letters, Vol. 35, Issue 13, pp. 2230-2232 (2010)

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We propose an inexpensive novel rapid prototyping approach to a maskless and fully adaptive photolithographic process. Phase-only computer-generated holograms of lithographic masks displayed on a liquid-crystal-on-silicon spatial light modulator were used in a holographic optical lithography system. Using holographic projection allows diffraction-limited performance within the given parameters of the optical system, adaptive software refocusing, and a continuous, pixel-free pattern. With the demonstrator, we have successfully proven the concept for micrometer-size lithographic features.

© 2010 Optical Society of America

OCIS Codes
(090.1760) Holography : Computer holography
(110.5220) Imaging systems : Photolithography
(230.3720) Optical devices : Liquid-crystal devices
(230.6120) Optical devices : Spatial light modulators

ToC Category:

Original Manuscript: April 2, 2010
Revised Manuscript: June 3, 2010
Manuscript Accepted: June 4, 2010
Published: June 25, 2010

Christoph Bay, Nils Hübner, Jon Freeman, and Tim Wilkinson, "Maskless photolithography via holographic optical projection," Opt. Lett. 35, 2230-2232 (2010)

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