Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd’s interferometer
Optics Letters, Vol. 35, Issue 20, pp. 3450-3452 (2010)
http://dx.doi.org/10.1364/OL.35.003450
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Abstract
We present a simple setup that combines immersion lithography with a Lloyd’s mirror interferometer. Aiming for smaller structure sizes, we have replaced the usual Lloyd’s interferometer by a triangular Littrow prism with one metal-coated side, which acts as a mirror. Because of the higher refractive index of the prism, the wavelength and, thus, the attainable structure sizes, are decreased significantly. Using a laser with a wavelength of
© 2010 Optical Society of America
OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(120.4640) Instrumentation, measurement, and metrology : Optical instruments
(220.4610) Optical design and fabrication : Optical fabrication
(220.4241) Optical design and fabrication : Nanostructure fabrication
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: July 27, 2010
Revised Manuscript: September 7, 2010
Manuscript Accepted: September 7, 2010
Published: October 12, 2010
Citation
Johannes de Boor, Dong Sik Kim, and Volker Schmidt, "Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd’s interferometer," Opt. Lett. 35, 3450-3452 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-20-3450
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