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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 35, Iss. 4 — Feb. 15, 2010
  • pp: 601–603

Investigations on the UV photorefractivity of Li Nb O 3 : Hf

Wenbo Yan, Lihong Shi, Hongjian Chen, Xinzheng Zhang, and Yongfa Kong  »View Author Affiliations


Optics Letters, Vol. 35, Issue 4, pp. 601-603 (2010)
http://dx.doi.org/10.1364/OL.35.000601


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Abstract

The UV photorefractivity of Li Nb O 3 : Hf was investigated by beam distortion and two-wave coupling experiments. A sharp decrease of beam distortion was found between Hf concentrations of 2 and 2.5 mol. % , indicating a significant increase of photoconductivity there. The energy-transfer direction of the two-wave coupling and the effect of chemical reduction on the UV photorefractivity reveal that electrons are the carriers responsible for the UV photorefraction. Moreover, dissimilar with Li Nb O 3 highly doped with Mg, Zn, and In, the grating recorded in Li Nb O 3 : Hf was found to be nearly stable in the dark but sensitive to red light, which can be attributed to the special location of Fe ions in the crystal lattice.

© 2010 Optical Society of America

OCIS Codes
(130.3730) Integrated optics : Lithium niobate
(190.5330) Nonlinear optics : Photorefractive optics

ToC Category:
Integrated Optics

History
Original Manuscript: October 6, 2009
Revised Manuscript: January 16, 2010
Manuscript Accepted: January 17, 2010
Published: February 12, 2010

Citation
Wenbo Yan, Lihong Shi, Hongjian Chen, Xinzheng Zhang, and Yongfa Kong, "Investigations on the UV photorefractivity of LiNbO3:Hf," Opt. Lett. 35, 601-603 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-4-601


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