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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 35, Iss. 6 — Mar. 15, 2010
  • pp: 883–885

Increased optical-damage resistance in tin-doped lithium niobate

Lizhong Wang, Shiguo Liu, Yongfa Kong, Shaolin Chen, Ziheng Huang, Li Wu, Romano Rupp, and Jingjun Xu  »View Author Affiliations


Optics Letters, Vol. 35, Issue 6, pp. 883-885 (2010)
http://dx.doi.org/10.1364/OL.35.000883


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Abstract

Applications of lithium niobate in nonlinear optics at high light intensities are seriously hampered by optical damage. Recent investigations have shown that Hf 4 + and Zr 4 + ions have some advantages in suppressing optical damage of Li Nb O 3 with respect to Mg 2 + . Here we present Sn-doped Li Nb O 3 (Sn:LN). Experimental results indicate that Sn:LN has similar optical damage resistance to Mg-doped Li Nb O 3 , but the doping threshold of Sn is only 2.5 mol. % , where its distribution coefficient is 0.98. Hence Sn 4 + ion turns out to be another good choice for increasing optical damage resistance of Li Nb O 3 .

© 2010 Optical Society of America

OCIS Codes
(160.3730) Materials : Lithium niobate
(160.5320) Materials : Photorefractive materials
(190.5330) Nonlinear optics : Photorefractive optics

ToC Category:
Materials

History
Original Manuscript: November 23, 2009
Revised Manuscript: January 17, 2010
Manuscript Accepted: February 1, 2010
Published: March 15, 2010

Citation
Lizhong Wang, Shiguo Liu, Yongfa Kong, Shaolin Chen, Ziheng Huang, Li Wu, Romano Rupp, and Jingjun Xu, "Increased optical-damage resistance in tin-doped lithium niobate," Opt. Lett. 35, 883-885 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-6-883


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