Resist shaping for replication of micro-optical elements with continuous relief in fused silica
Optics Letters, Vol. 35, Issue 8, pp. 1169-1171 (2010)
http://dx.doi.org/10.1364/OL.35.001169
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Abstract
To improve the replicating quality in producing micro-optical elements with continuous relief, the resist layer on substrate is shaped against the negative stamp by dry etching to enable it to have the same geometry as the pattern area of the negative stamp. The negative stamp is then aligned with and imprinted into the shaped resist. The produced continuous relief is transferred into the substrate by dry etching as well. Experiment results indicate that this method has both the long service life of a negative stamp and easy filling of a positive stamp.
© 2010 Optical Society of America
OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(220.4000) Optical design and fabrication : Microstructure fabrication
(050.6875) Diffraction and gratings : Three-dimensional fabrication
ToC Category:
Diffraction and Gratings
History
Original Manuscript: January 19, 2010
Revised Manuscript: March 11, 2010
Manuscript Accepted: March 11, 2010
Published: April 12, 2010
Citation
Peng Jin, Yulong Gao, Tingting Liu, Xiaojun Li, and Jiubin Tan, "Resist shaping for replication of micro-optical elements with continuous relief in fused silica," Opt. Lett. 35, 1169-1171 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-8-1169
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