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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 35, Iss. 9 — May. 1, 2010
  • pp: 1311–1313

Analysis of microstructural relaxation phenomena in laser-modified fused silica using confocal Raman microscopy

Manyalibo J. Matthews, Ryan M. Vignes, Diane Cooke, Steven T. Yang, and James S. Stolken  »View Author Affiliations


Optics Letters, Vol. 35, Issue 9, pp. 1311-1313 (2010)
http://dx.doi.org/10.1364/OL.35.001311


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Abstract

Fused-silica microstructural changes associated with localized 10.6 μ m C O 2 laser heating are reported. Spatially resolved shifts in the high-frequency asymmetric stretch transverse-optic phonon mode of Si O 2 were measured using confocal Raman microscopy, allowing construction of axial fictive temperature ( T f ) maps for various laser-heating conditions. A Fourier conduction-based finite-element model was employed to compute on-axis temperature–time histories, and, in conjunction with a Tool–Narayanaswamy form for structural relaxation, used to fit T f ( z ) profiles to extract relaxation parameters. Good agreement between the calculated and measured T f was found, yielding reasonable values for relaxation time and activation enthalpy in the laser-modified silica.

© 2010 U.S. Government

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(160.2750) Materials : Glass and other amorphous materials
(180.1790) Microscopy : Confocal microscopy
(300.6450) Spectroscopy : Spectroscopy, Raman

ToC Category:
Microscopy

History
Original Manuscript: February 3, 2010
Manuscript Accepted: March 10, 2010
Published: April 20, 2010

Citation
Manyalibo J. Matthews, Ryan M. Vignes, Diane Cooke, Steven T. Yang, and James S. Stolken, "Analysis of microstructural relaxation phenomena in laser-modified fused silica using confocal Raman microscopy," Opt. Lett. 35, 1311-1313 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-9-1311


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