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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 35, Iss. 9 — May. 1, 2010
  • pp: 1404–1406

Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging

Bo Peng, Xiangzhao Wang, Zicheng Qiu, Qiongyan Yuan, and Yuting Cao  »View Author Affiliations

Optics Letters, Vol. 35, Issue 9, pp. 1404-1406 (2010)

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We discuss the aberration-induced intensity imbalance of alternating phase-shifting mask (Alt-PSM) in lithographic imaging, in contrast to numerous studies on mask-induced intensity imbalance. Based on the Hopkins theory of partial coherent imaging, a linear relationship between the intensity difference of adjacent peaks in an Alt-PSM image and even aberration is established by formulations and verified by numerical results. The application of the linear relationship is briefly discussed.

© 2010 Optical Society of America

OCIS Codes
(050.5080) Diffraction and gratings : Phase shift
(110.2960) Imaging systems : Image analysis
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography

ToC Category:
Imaging Systems

Original Manuscript: November 9, 2009
Revised Manuscript: March 17, 2010
Manuscript Accepted: March 22, 2010
Published: April 26, 2010

Bo Peng, Xiangzhao Wang, Zicheng Qiu, Qiongyan Yuan, and Yuting Cao, "Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging," Opt. Lett. 35, 1404-1406 (2010)

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  1. R. L. Gordon, C. A. Mack, and J. S. Petersen, Proc. SPIE 3546, 606 (1998). [CrossRef]
  2. K. Adam and A. R. Neureuther, J. Microlithogr. Microfabr. Microsyst. 1, 253 (2002). [CrossRef]
  3. J. Tirapu-Azpiroz and E. Yablonovitch, J. Opt. Soc. Am. A 23, 821 (2006). [CrossRef]
  4. P. Liu, Y. Cao, L. Chen, G. Chen, M. Feng, J. Jiang, H.-Y. Liu, S. Suh, S.-W. Lee, and S. Lee, Proc. SPIE 6520, 65200R (2007). [CrossRef]
  5. J. P. Kirk, S. Schank, and C.-Y. LinProc. SPIE 4346, 1355 (2001). [CrossRef]
  6. H. H. Hopkins, Proc. R. Soc. London Ser. A 217, 408 (1953). [CrossRef]
  7. H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, Proc. SPIE 4346, 394 (2001). [CrossRef]
  8. J. Sung, M. Pitchumani, and E. Johnson, Appl. Opt. 42, 1987 (2003). [CrossRef] [PubMed]
  9. Q. Yuan, X. Wang, Z. Qiu, F. Wang, and M. Ma, Microelectron. Eng. 86, 78 (2009). [CrossRef]

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