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Nanomembrane transfer process for intricate photonic device applications |
Optics Letters, Vol. 36, Issue 1, pp. 58-60 (2011)
http://dx.doi.org/10.1364/OL.36.000058
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Abstract
We demonstrate a process for the fabrication and transfer of silicon nanomembranes (Si-NMs) that have been released from their host substrates and redeposited on foreign flexible or flat substrates. The transfer process developed allows intricate photonic devices to be transferred via NMs to a variety of new substrate materials. This allows the transferred devices to benefit from the material properties of both substrate and NM. Our process is designed to transfer and stack large-area photonic devices without compromising their optical performance. The process has been used to transfer large-area unpatterned silicon NMs, in excess of
© 2011 Optical Society of America
OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(350.4238) Other areas of optics : Nanophotonics and photonic crystals
(220.4241) Optical design and fabrication : Nanostructure fabrication
(130.5296) Integrated optics : Photonic crystal waveguides
ToC Category:
Optical Design and Fabrication
History
Original Manuscript: September 10, 2010
Revised Manuscript: November 24, 2010
Manuscript Accepted: November 29, 2010
Published: December 23, 2010
Citation
Mathew J. Zablocki, Ahmed Sharkawy, Ozgenc Ebil, and Dennis W. Prather, "Nanomembrane transfer process for intricate photonic device applications," Opt. Lett. 36, 58-60 (2011)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-36-1-58
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