OSA's Digital Library

Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 36, Iss. 10 — May. 15, 2011
  • pp: 1899–1901

Binary amplitude holograms made from dyed photoresist

Quandou Wang, Ulf Griesmann, and John H. Burnett  »View Author Affiliations


Optics Letters, Vol. 36, Issue 10, pp. 1899-1901 (2011)
http://dx.doi.org/10.1364/OL.36.001899


View Full Text Article

Enhanced HTML    Acrobat PDF (396 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null optics in the form metrology of aspheric surfaces and wavefronts. A pigment that strongly absorbs light near 633 nm was dissolved in a positive photoresist and the dyed resist was spun onto silica glass substrates. Stable resist layers were obtained that were essentially opaque at 633 nm with little effect on the transmittance of the resist in the UV. A Fresnel zone plate was fabricated from the dyed resist layer using contact lithography, and its performance was demonstrated at 633 nm .

© 2011 Optical Society of America

OCIS Codes
(090.1970) Holography : Diffractive optics
(220.3740) Optical design and fabrication : Lithography
(220.4840) Optical design and fabrication : Testing

ToC Category:
Holography

History
Original Manuscript: December 16, 2010
Revised Manuscript: April 15, 2011
Manuscript Accepted: April 16, 2011
Published: May 13, 2011

Citation
Quandou Wang, Ulf Griesmann, and John H. Burnett, "Binary amplitude holograms made from dyed photoresist," Opt. Lett. 36, 1899-1901 (2011)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-36-10-1899


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. B. R. Brown and A. W. Lohmann, Appl. Opt. 5, 967 (1966). [CrossRef] [PubMed]
  2. A. W. Lohmann and D. P. Paris, Appl. Opt. 6, 1739(1967). [CrossRef] [PubMed]
  3. A. J. MacGovern and J. C. Wyant, Appl. Opt. 10, 619 (1971). [CrossRef] [PubMed]
  4. P. L. Ransom and R. F. Henton, Appl. Opt. 13, 2765 (1974). [CrossRef] [PubMed]
  5. J. H. Burge, Proc. SPIE 1994, 248 (1994). [CrossRef]
  6. Y.-C. Chang, P. Zhou, and J. H. Burge, Appl. Opt. 45, 4223 (2006). [CrossRef] [PubMed]
  7. P. Zhou and J. H. Burge, Appl. Opt. 46, 657 (2007). [CrossRef] [PubMed]
  8. P. Zhou and J. H. Burge, Appl. Opt. 46, 6572 (2007). [CrossRef] [PubMed]
  9. P. Zhou and J. H. Burge, Opt. Express 15, 15410 (2007). [CrossRef] [PubMed]
  10. C. Pruss, S. Reichelt, H. Tiziani, and W. Osten, Opt. Eng. 43, 2534 (2004). [CrossRef]
  11. C. Pruss, E. Garbusi, and W. Osten, Opt. Photonics News 19(4), 24 (2008). [CrossRef]
  12. W. B. Veldkamp, Jpn. J. Appl. Phys. 45, 6550 (2006). [CrossRef]
  13. K. Biedermann and O. Holmgren, Appl. Opt. 16, 2014 (1977). [CrossRef] [PubMed]
  14. M. J. Beesley and J. G. Castledine, Appl. Opt. 9, 2720 (1970). [CrossRef] [PubMed]
  15. F. Iwata and J. Tsujiuchi, Appl. Opt. 13, 1327 (1974). [CrossRef] [PubMed]
  16. R. C. Enger and S. K. Case, J. Opt. Soc. Am. 73, 1113 (1983). [CrossRef]
  17. C. A. Mack, Solid State Technol. 31, 125 (1988).
  18. D. Kunze and R. Pforr, Microelectron. Eng. 25, 3 (1994). [CrossRef]
  19. D. J. Guerrero, B. DiMenna, T. Flaim, R. Mercado, and S. Sun, Proc. SPIE 5017, 298 (2003). [CrossRef]
  20. H. Zollinger, Color Chemistry, 3rd ed. (Wiley, 2001).
  21. “Data sheet for Epolin Epolight 5262 dye,” http://www.epolin.com (April 28, 2011).
  22. “Data sheet for Rohm and Haas/Shipley MICROPOSIT S1800 Series Photoresists,” http://www.epolin.com (April 28, 2011).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited