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Optics Letters

Optics Letters


  • Vol. 36, Iss. 10 — May. 15, 2011
  • pp: 1899–1901

Binary amplitude holograms made from dyed photoresist

Quandou Wang, Ulf Griesmann, and John H. Burnett  »View Author Affiliations

Optics Letters, Vol. 36, Issue 10, pp. 1899-1901 (2011)

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A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null optics in the form metrology of aspheric surfaces and wavefronts. A pigment that strongly absorbs light near 633 nm was dissolved in a positive photoresist and the dyed resist was spun onto silica glass substrates. Stable resist layers were obtained that were essentially opaque at 633 nm with little effect on the transmittance of the resist in the UV. A Fresnel zone plate was fabricated from the dyed resist layer using contact lithography, and its performance was demonstrated at 633 nm .

© 2011 Optical Society of America

OCIS Codes
(090.1970) Holography : Diffractive optics
(220.3740) Optical design and fabrication : Lithography
(220.4840) Optical design and fabrication : Testing

ToC Category:

Original Manuscript: December 16, 2010
Revised Manuscript: April 15, 2011
Manuscript Accepted: April 16, 2011
Published: May 13, 2011

Quandou Wang, Ulf Griesmann, and John H. Burnett, "Binary amplitude holograms made from dyed photoresist," Opt. Lett. 36, 1899-1901 (2011)

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