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Optics Letters

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  • Vol. 36, Iss. 15 — Aug. 1, 2011
  • pp: 2946–2948

Low-loss plasmonic hybrid optical ridge waveguide on silicon-on-insulator substrate

Xiaoliu Zuo and Zhijun Sun  »View Author Affiliations


Optics Letters, Vol. 36, Issue 15, pp. 2946-2948 (2011)
http://dx.doi.org/10.1364/OL.36.002946


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Abstract

To achieve low loss and complete confinement of light, we propose and study a plasmonic hybrid optical waveguide fabricated on an silicon-on-insulator substrate. Using controlled oxidation and etching processes, a deep submicrometer Si core is fabricated based on UV photolithography patterning. The as-fabricated waveguide demonstrates a very low propagation loss of 1.6 dB / mm at 1550 nm . The numerical study discloses the hybrid characteristics of the mode. It is shown that the optical power of the waveguiding mode distributes more in the high-index Si-core region, and the metal cover further confines the light beyond the diffraction limit. The hybrid waveguide may be applied in compact, high-density Si photonic integrated circuits.

© 2011 Optical Society of America

OCIS Codes
(130.2790) Integrated optics : Guided waves
(230.7370) Optical devices : Waveguides
(250.5403) Optoelectronics : Plasmonics

ToC Category:
Optical Devices

History
Original Manuscript: June 21, 2011
Revised Manuscript: July 6, 2011
Manuscript Accepted: July 7, 2011
Published: August 1, 2011

Citation
Xiaoliu Zuo and Zhijun Sun, "Low-loss plasmonic hybrid optical ridge waveguide on silicon-on-insulator substrate," Opt. Lett. 36, 2946-2948 (2011)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-36-15-2946

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