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Optics Letters

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  • Vol. 36, Iss. 16 — Aug. 15, 2011
  • pp: 3176–3178

Tunable two-mirror interference lithography system for wafer-scale nanopatterning

Weidong Mao, Ishan Wathuthanthri, and Chang-Hwan Choi  »View Author Affiliations


Optics Letters, Vol. 36, Issue 16, pp. 3176-3178 (2011)
http://dx.doi.org/10.1364/OL.36.003176


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Abstract

We have designed and analyzed a novel (to the best of our knowledge) two-beam interference lithography system for large-area (wafer-level) nanopatterning with enhanced tunability of pattern periodicities. The tunable feature has been achieved by placing two rotational mirrors in the expanded beam paths at regulated angles for a desired period. Theoretical analyses show that the effective pattern coverage area greater than a 4 in . ( 10 cm ) wafer scale is attainable with a 325 nm ( 30 cm coherence length) HeCd laser and 4 in . ( 10 cm ) mirrors, while the pattern coverage area is restrained by the overruling effects between the optical coherence and mirror size. The experimental results also demonstrate uniform nanopatterns at varying periods ( 250 750 nm ) on 4 in . ( 10 cm ) substrates, validating the theoretical analyses. The tunable two-mirror interferometer will offer a convenient and robust way to prepare large-area nanostructures on a wafer scale with superior tunability in their pattern periodicities.

© 2011 Optical Society of America

OCIS Codes
(090.2880) Holography : Holographic interferometry
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(220.3740) Optical design and fabrication : Lithography
(260.3160) Physical optics : Interference
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: May 17, 2011
Revised Manuscript: July 7, 2011
Manuscript Accepted: July 18, 2011
Published: August 11, 2011

Citation
Weidong Mao, Ishan Wathuthanthri, and Chang-Hwan Choi, "Tunable two-mirror interference lithography system for wafer-scale nanopatterning," Opt. Lett. 36, 3176-3178 (2011)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-36-16-3176


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