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Optics Letters

Optics Letters


  • Vol. 36, Iss. 17 — Sep. 1, 2011
  • pp: 3344–3346

Infrared suppression by hybrid EUV multilayer—IR etalon structures

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk  »View Author Affiliations

Optics Letters, Vol. 36, Issue 17, pp. 3344-3346 (2011)

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We have developed a multilayer mirror for extreme UV (EUV) radiation ( 13.5 nm ), which has near-zero reflectance for IR line radiation ( 10.6 μm ). The EUV reflecting multilayer is based on alternating B 4 C and Si layers. Substantial transparency of these materials with respect to the IR radiation allowed the integration of the multilayer coating in a resonant quarter-wave structure for 10.6 μm . Samples were manufactured using magnetron sputtering deposition technique and demonstrated suppression of the IR radiation by up to 3 orders of magnitude. The EUV peak reflectance amounts 45% at 13.5 nm , with a bandwidth at FWHM being 0.284 nm . Therefore such a mirror could replace conventional multilayer mirrors to suppress undesired spectral components in monochromatic imaging applications, including EUV photolithography.

© 2011 Optical Society of America

OCIS Codes
(230.1480) Optical devices : Bragg reflectors
(310.1210) Thin films : Antireflection coatings
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(310.4165) Thin films : Multilayer design
(230.7408) Optical devices : Wavelength filtering devices

ToC Category:
Thin Films

Original Manuscript: June 10, 2011
Revised Manuscript: July 25, 2011
Manuscript Accepted: July 26, 2011
Published: August 19, 2011

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, "Infrared suppression by hybrid EUV multilayer—IR etalon structures," Opt. Lett. 36, 3344-3346 (2011)

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