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Optics Letters

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  • Vol. 36, Iss. 17 — Sep. 1, 2011
  • pp: 3386–3388

Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements

R. A. Loch, A. Dubrouil, R. Sobierajski, D. Descamps, B. Fabre, P. Lidon, R. W. E. van de Kruijs, F. Boekhout, E. Gullikson, J. Gaudin, E. Louis, F. Bijkerk, E. Mével, S. Petit, E. Constant, and Y. Mairesse  »View Author Affiliations


Optics Letters, Vol. 36, Issue 17, pp. 3386-3388 (2011)
http://dx.doi.org/10.1364/OL.36.003386


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Abstract

We characterize the phase shift induced by reflection on a multilayer mirror in the extreme UV range (80– 93 eV ) using two techniques: one based on high order harmonic generation and attosecond metrology (reconstruction of attosecond beating by interference of two-photon transitions), and a second based on synchrotron radiation and measurements of standing waves (total electron yield). We find an excellent agreement between the results from the two measurements and a flat group delay shift ( ± 40 as ) over the main reflectivity peak of the mirror.

© 2011 Optical Society of America

OCIS Codes
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(190.0190) Nonlinear optics : Nonlinear optics
(320.0320) Ultrafast optics : Ultrafast optics
(340.0340) X-ray optics : X-ray optics

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: April 28, 2011
Manuscript Accepted: July 27, 2011
Published: August 24, 2011

Citation
R. A. Loch, A. Dubrouil, R. Sobierajski, D. Descamps, B. Fabre, P. Lidon, R. W. E. van de Kruijs, F. Boekhout, E. Gullikson, J. Gaudin, E. Louis, F. Bijkerk, E. Mével, S. Petit, E. Constant, and Y. Mairesse, "Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements," Opt. Lett. 36, 3386-3388 (2011)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-36-17-3386


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