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Optics Letters

Optics Letters


  • Vol. 36, Iss. 2 — Jan. 15, 2011
  • pp: 229–231

Large-area, uniform, high-spatial-frequency ripples generated on silicon using a nanojoule-femtosecond laser at high repetition rate

R. Le Harzic, D. Dörr, D. Sauer, M. Neumeier, M. Epple, H. Zimmermann, and F. Stracke  »View Author Affiliations

Optics Letters, Vol. 36, Issue 2, pp. 229-231 (2011)

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Large-area high-spatial-frequency patterns (HSFLs) of λ / 6 periodicity have been generated by a nanojoule-femtosecond laser scanning technique ( 80 MHz , 170 fs , 700 950 nm ) at the silicon–air interface. The excellent large-area uniformity allowed reproducible and accurate measurements of the periodicity. Variation of experimental param eters as illumination geometry, and pulse energy and number showed no influence on the ripple spacing. A wavelength dependence was observed and compared to current models of HSFL formation. A particular second-armonic model was found to match the results best but needs to take into account transient changes in the refractive index under laser exposure. A second-harmonic mechanism is further supported by direct spectroscopic observation.

© 2011 Optical Society of America

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(190.4350) Nonlinear optics : Nonlinear optics at surfaces
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Lasers and Laser Optics

Original Manuscript: September 8, 2010
Revised Manuscript: November 18, 2010
Manuscript Accepted: December 6, 2010
Published: January 12, 2011

R. Le Harzic, D. Dörr, D. Sauer, M. Neumeier, M. Epple, H. Zimmermann, and F. Stracke, "Large-area, uniform, high-spatial-frequency ripples generated on silicon using a nanojoule-femtosecond laser at high repetition rate," Opt. Lett. 36, 229-231 (2011)

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