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Random phase mask in a filamentation regime: application to the localization of point sources |
Optics Letters, Vol. 36, Issue 5, pp. 684-686 (2011)
http://dx.doi.org/10.1364/OL.36.000684
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Abstract
We present a optical system with an extended point-spread function (PSF) for the localization of point sources in the visible and IR spectral ranges with a subpixel precision. This compact system involves a random phase mask (RPM) as its unique component. It exhibits original properties, because this RPM is used in a particular regime, called the “filamentation regime,” before the speckle region. The localization is performed by calculating the phase correlation between the PSF and the image obtained under off-axis illumination. Numerical simulations are presented to assess the basic optical properties of this RPM in the filamentation regime.
© 2011 Optical Society of America
OCIS Codes
(030.5770) Coherence and statistical optics : Roughness
(030.6600) Coherence and statistical optics : Statistical optics
(070.7345) Fourier optics and signal processing : Wave propagation
ToC Category:
Coherence and Statistical Optics
History
Original Manuscript: December 16, 2010
Revised Manuscript: January 20, 2011
Manuscript Accepted: January 20, 2011
Published: February 24, 2011
Citation
Florence de la Barrière, Guillaume Druart, Nicolas Guérineau, Yann Ferrec, Jean Taboury, and Jérôme Primot, "Random phase mask in a filamentation regime: application to the localization of point sources," Opt. Lett. 36, 684-686 (2011)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-36-5-684
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