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Iridium/silicon multilayers for extreme ultraviolet applications in the 20–35 nm wavelength range |
Optics Letters, Vol. 36, Issue 7, pp. 1203-1205 (2011)
http://dx.doi.org/10.1364/OL.36.001203
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Abstract
We have developed an Ir/Si multilayer for extreme ultraviolet (EUV) applications. Normal incidence reflectance measurements of a prototype film tuned to
© 2011 Optical Society of America
OCIS Codes
(260.7200) Physical optics : Ultraviolet, extreme
(310.1860) Thin films : Deposition and fabrication
(350.1260) Other areas of optics : Astronomical optics
(310.4165) Thin films : Multilayer design
ToC Category:
Thin Films
History
Original Manuscript: January 20, 2011
Revised Manuscript: February 25, 2011
Manuscript Accepted: February 25, 2011
Published: March 28, 2011
Citation
Paola Zuppella, Gianni Monaco, Alain Jody Corso, Piergiorgio Nicolosi, David L. Windt, Valentina Bello, Giovanni Mattei, and Maria Guglielmina Pelizzo, "Iridium/silicon multilayers for extreme ultraviolet applications in the 20–35 nm wavelength range," Opt. Lett. 36, 1203-1205 (2011)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-36-7-1203
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