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Optics Letters

Optics Letters


  • Vol. 36, Iss. 7 — Apr. 1, 2011
  • pp: 1203–1205

Iridium/silicon multilayers for extreme ultraviolet applications in the 20–35 nm wavelength range

Paola Zuppella, Gianni Monaco, Alain Jody Corso, Piergiorgio Nicolosi, David L. Windt, Valentina Bello, Giovanni Mattei, and Maria Guglielmina Pelizzo  »View Author Affiliations

Optics Letters, Vol. 36, Issue 7, pp. 1203-1205 (2011)

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We have developed an Ir/Si multilayer for extreme ultraviolet (EUV) applications. Normal incidence reflectance measurements of a prototype film tuned to 30 nm wavelength show superior performance relative to a conventional Mo/Si multilayer structure; we also find good stability over time. Transmission electron microscopy and electron dispersive x-ray spectroscopy have been used to examine the microstructure and interface properties of this system: we find amorphous Si layers and polycrystalline Ir layers, with asymmetric interlayer regions of mixed composition. Potential applications of Ir/Si multilayers include instrumentation for solar physics and laboratory EUV beam manipulation.

© 2011 Optical Society of America

OCIS Codes
(260.7200) Physical optics : Ultraviolet, extreme
(310.1860) Thin films : Deposition and fabrication
(350.1260) Other areas of optics : Astronomical optics
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

Original Manuscript: January 20, 2011
Revised Manuscript: February 25, 2011
Manuscript Accepted: February 25, 2011
Published: March 28, 2011

Paola Zuppella, Gianni Monaco, Alain Jody Corso, Piergiorgio Nicolosi, David L. Windt, Valentina Bello, Giovanni Mattei, and Maria Guglielmina Pelizzo, "Iridium/silicon multilayers for extreme ultraviolet applications in the 20–35 nm wavelength range," Opt. Lett. 36, 1203-1205 (2011)

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