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Optics Letters

Optics Letters


  • Vol. 36, Iss. 9 — May. 1, 2011
  • pp: 1593–1595

Two degrees-of-freedom Lloyd–mirror interferometer for superior pattern coverage area

Ishan Wathuthanthri, Weidong Mao, and Chang-Hwan Choi  »View Author Affiliations

Optics Letters, Vol. 36, Issue 9, pp. 1593-1595 (2011)

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In this study, we have developed a tunable Lloyd–mirror interferometer with two degrees of freedom, in contrast to a traditional system with one degree of freedom. This new Lloyd–mirror interferometer allows an angular rotation of the mirror independently from that of a sample stage, resulting in an increased pattern coverage area with tunable pattern periodicity. Both theoretical and experimental results verify that the tunable characteristic of the modified configuration enhances the nanopatterning capabilities of the Lloyd–mirror interference lithography system especially in achieving greater pattern coverage area for larger pattern periodicities.

© 2011 Optical Society of America

OCIS Codes
(090.2880) Holography : Holographic interferometry
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(260.3160) Physical optics : Interference
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: December 13, 2010
Revised Manuscript: March 30, 2011
Manuscript Accepted: March 30, 2011
Published: April 25, 2011

Ishan Wathuthanthri, Weidong Mao, and Chang-Hwan Choi, "Two degrees-of-freedom Lloyd–mirror interferometer for superior pattern coverage area," Opt. Lett. 36, 1593-1595 (2011)

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